Optimizing Metalization Patterns for Yearly Yield

Normally solar cells are optimized for maximum efficiency at standard test conditions. It is recognized ever more widely that cells and modules should be optimized for maximum yield at their operating conditions [1]. The metalization pattern is one aspect of this optimization. An optimized pattern can be implemented at no cost in for instance the case of screen-printed solar cells, as it merely requires changing the screen printing mask. We demonstrate that most H-grid metalization programs can be used without any modification for optimization for yearly yield. We then use this method to optimize for both yearly yield for irradiation conditions as they occur in the Netherlands and standard test conditions. It turns out that we arrive for yearly optimization at fewer bus bars and a much lower number of fingers. The total yield is improved by .1%.